dC/dZ Measurements: dC/dZ measures the change in capacitance with respect to the tip-sample distance, providing information about local dielectric properties.

Benefits: Enables mapping of dielectric constants and investigation of thin film properties at the nanoscale.

​

​​​

EFC (Electrical Field Compensation for MFM):

EFC nullifies the electrostatic interaction between the tip and sample during Magnetic Force Microscopy measurements.

Benefits: Allows for pure magnetic measurements without electrostatic interference, crucial for accurate characterization of magnetic nanostructures.

​​​​

Lift Mode: 

An optional mode where the tip is lifted to a specific height above the surface after recording topography, then used for potential measurement. Benefits: Useful for samples with large height variations or when separating long-range electrostatic forces from short-range forces is necessary.

These advanced features expand the capabilities of HD-KFM III, making it a versatile tool for a wide range of nanoscale electrical characterization needs.